UV Nanoimprinting with quartz molds

Report describing UV Nanoimprinting Lithography (UV-NIL), using nanostructured quartz molds. In order to accurately characterize the pattern transfer on a negative resist deposited on a Si substrate, optical microscopy (OM) and atomic force microscopy (AFM) were carried out both on the quartz mold and on the structures obtained on resist after UV NIL process.

Download the application note from CNR-IMM Catania