SUSS MicroTec’s systems for photomask processing are designed for high-quality photomask cleaning and related processes.
MaskTrack Pro is designed to balance the most stringent conditions of 193i 1x nm half-pitch (hp) DPT, extreme-ultraviolet lithography (EUVL) and nanoimprint lithography (NIL) processing with innovative techniques to maximize mask performance. Its modular platform guarantees maximum flexibility and customization. With its highest first pass cleaning yield MaskTrack Pro has been accepted as the platform of choice in the industry.
The HMxSquare is designed for high quality substrate processing in photomask applications as well as opto-electronics, OLEDand special semiconductor back-end (MEMS) applications. It offers develop, etch and cleaning functionalities. The HMxSquare is manually operated and enables processing of small series or pilot production of special substrate.
The ASx series is SUSS MicroTec’s automated photomask processing platform with advanced bake, develop and clean technologies. The series offers the reliability, stability and performance needed to meet critical challenges in defect-free processing of masks.
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